| The silicon compound described in Example CD12-3 is to be deposited on the large sheets separated by a distance d shown in Figure CDP12-E. The mass transfer correlation for flow across a flat plate varies along the length of the plate and is given by the expression | ||
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| (a) Derive an expression for the deposition thickness as a
function of position. (b) How would you suggest changing the parameters (e.g., d, U) or operating conditions to make the deposition thickness uniform? (c) Suppose that a wire screen were placed a small distance S from the sheets so that the gas in that region was virtually stagnant. How would this addition affect the deposition thickness? |
[2nd Ed. P11-21]
