Elements of
Chemical Reaction Engineering
6th Edition



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Essentials of
Chemical Reaction Engineering
Second Edition

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Chapter 15: Diffusion and Reaction in Porous Catalysts

Additional Homework Problems

CDP15-ED

  It is proposed that the wafer thickness in a LPCVD reactor could be made more uniform if the temperature were to be increased along the length of the reactor. The feed composition is 15% A and 85% carrier gas and enters at 1000 K and 1 torr (1mmHg). Determine the temperature profile to achieve uniform thickness at the center of the wafer. Also determine the wafer shape as a function of distance down the reactor. (Note: The feed composition as well as flow rate can also be varied.)
     
   

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[2nd Ed. P11-18]