2
14 8
1 2
2.32
C
Silicon dioxide intended to descibe the oxide layer formed on the surface
of silicon semiconductor devices. Density is take from the CRC chem/physics
6
5 8 11 13 14 19
.0401 .5396 .0282 .0116 .3772 .0033
2.23
This composition was taken from Corning No. 7740
!---------------------------------- this is line 13 -------------
Optical parameters (use same number of digits)
enter first number of wavelength points to use (max. 30)
then, wavelenghts (as integers, in nm)
then, n(wavelenghts)
then, absorption coeff (wavelenghts) (in cm-1)
then, wavelength for the scattering coeff
then, scattering coeff (in cm-1)


1
550 
1.2341 
0.0
400
0.0
